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Conférences - Métrologie et instrumentation - États-Unis

Conference-Service.com met à la disposition de ses visiteurs des listes de conférences et réunions dans le domaine scientifique. Ces listes sont publiées pour le bénéfice des personnes qui cherchent une conférence, mais aussi, bien sûr, pour celui des organisateurs. Noter que, malgré tout le soin que nous apportons à la vérification des données entrées dans nos listes, nous ne pouvons accepter de responsabilité en ce qui concerne leur exactitude ou étendue. Pensez donc à vérifier les informations présentées avec les organisateurs de la conférence ou de la réunion avant de vous engager à y participer!

Les organisateurs peuvent soumettre une réunion ou une conférence pour inclusion dans nos listes, et ceci gratuitement.

1.haut de la page[ID=288284]SPIE DSS Ocean Sensing and Monitoring II
05 Avr 2010 → 09 Avr 2010; Orlando, Florida, États-Unis

Résumé: This conference is aimed at bringing together research and technical personnel, from industry, governments, and especially academia, to foster cooperation to increase the utility of operational oceanographic assets to meet defense and homeland security concerns.

Sujets: oceanography, underwater, imaging, remote sensing, ocean, marine, optics, acoustics, sensors, platforms, UUV, AUV, gliders, buoys, ship, sonar, observatory, circulation model, ocean forecasting
Page web: http://spie.org/ds211/
Sujets apparentés: Océanographie
2.haut de la page[ID=309557]IMCAS'10 — 9th WSEAS Int. Conf. on INSTRUMENTATION, MEASUREMENT, CIRCUITS and SYSTEMS
10 Avr 2010 → 12 Avr 2010; Hangzhou Supported By The China Asia Jiliang Unive, États-Unis
Organisateur: World Scientific and Engineering Academy and Society (WSEAS)
Page web: http://www.wseas.us/conferences/2010/hangzhou/imcas/
Sujets apparentés: Électronique
3.haut de la page[ID=269875]Novel Techniques in Microscopy
11 Avr 2010 → 15 Avr 2010; Miami, États-Unis

Résumé: The Novel Techniques in Microscopy Meeting aims at bringing together communities such as lighting, computer graphics, color technologists, optical designers, light sources and virtual reality towards the common goal of design, production and understanding of ambient lighting and a lit model's appearance.

Contact: OSA Customer Service; Mél.: custserv@osa.org
Sujets apparentés: Optique et lasers; Microscopie
 
4.haut de la page[ID=297531]Surface Analysis comprehensive short courses
19 Avr 2010 → 23 Avr 2010; Dayton, Ohio, États-Unis

Résumé: This five-day set of short courses on the two major electron spectroscopy techniques, Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS/ESCA) is designed for scientists, engineers, technicians, and students, who would like a detailed understanding of the uses of AES, XPS/ESCA, and Data Processing for surface analysis and depth profiling. The courses can be taken as a 5-day package or individually.

Page web: http://www.surfaceanalysis.org/schedule.html
Sujets apparentés: Physique de la matière condensée et des matériaux
 
5.haut de la page[ID=333366]BIW10 — 14th Beam Instrumentation Workshop
02 Mai 2010 → 06 Mai 2010; Santa Fe, New Mexico, États-Unis
Page web: http://www.lanl.gov/conferences/biw10/
Sujets apparentés: Accélérateurs de particules
 
6.haut de la page[ID=322352] 18th Topical Conference on High-Temperature Plasma Diagnostics
16 Mai 2010 → 20 Mai 2010; Wildwood, NJ, États-Unis
Sujets: magnetic confinement fusion, inertial confinement fusion, space plasmas, astrophysics, and industrial applications to discuss mutual problems in the development of instrumentation and experimental techniques for the characterization of high-temperature plasmas.
Page web: http://htpd2010.pppl.gov/
Sujets apparentés: Physique des plasmas
 
7.haut de la page[ID=310919]SPIE Scanning Microscopy 2010
17 Mai 2010 → 19 Mai 2010; Monterey, Californie, États-Unis

Résumé: Scanning microscopy for forensics, food analysis, medical applications, and health and safety.

Page web: http://spie.org/x19036.xml
Contact: SPIE, PO Box 10, Bellingham, WA 98227-0010 US ; Tél.: ((360) 676-3290)
Sujets apparentés: Microscopie
 
8.haut de la page[ID=335896]Metrology 2010
18 Mai 2010 → 20 Mai 2010; Moscou, États-Unis
Page web: http://www.metrol.expoprom.ru/en/
 
9.haut de la page[ID=304874]Electron Backscatter Diffraction 2010
24 Mai 2010 → 26 Mai 2010; Madison, Wisc., États-Unis
Page web: http://www.microbeamanalysis.org/ebsd-2010
Contact: J. Fournelle University of Wisconsin Madison, Department of Geoscience, 1215 W. Dayton St. Madison Wisc. U.S.A. 53706; Tél.: (+1-608-262-7964)
 
10.haut de la page[ID=304002] Symposium on Radiation Measurements and Applications XII
24 Mai 2010 → 28 Mai 2010; Ann Arbor, MI, États-Unis
Sujets: accelerator physics, applied ysics,astrophysics, atomic physics, biophysics, electronics, energy physics, environmental physics, fundamental constants, geophysics, high-energy physics, industrial physics, low temperature physics, measurement science technology, medical physics, nanotechnology, neutron physics, nuclear physics, optics and optoelectronics, particles and fields, photonics, physics of beams, radiation physics,r adiation protection, space physics, subatomic physics, synchrotron radiation.
Page web: http://rma-symposium.engin.umich.edu
 
11.haut de la page[ID=327259]Lehigh Microscopy School
06 Jui 2010 → 18 Jui 2010; Bethlehem, PA, États-Unis

Résumé: The Lehigh Microscopy School will be celebrating its 40th anniversary in June 2010. Considered to be the most comprehensive set of courses in electron and scanning probe microscopy in the world, the Lehigh Microscopy Schools have attracted more than 5,000 professionals from 50 states and 34 countries since its inception in 1970. During the two-week school, lecturers from the world’s leading research institutions and universities teach everything from basic to advanced microscopy. Course offerings include:

Scanning Electron Microscopy and X-ray Microanalysis (June 7-11)
Introduction to SEM and EDS for the New Operator (June 6)
Scanning Probe Microscopy: From Fundamentals to Advanced Applications (June 14-17)
Problem Solving with SEM, X-ray Microanalysis, and Electron Backscatter Patterns (June 14-18)
Quantitative X-ray Microanalysis: Problem Solving using EDS and WDS Techniques (June 14-18)
Scanning Transmission Electron Microscopy: From Fundamentals to Advanced Applications (June 14-17)
Focused Ion Beam (FIB): Instrumentation and Applications (June 14-17)

Page web: http://www.lehigh.edu/microscopy/
Sujets apparentés: Microscopie
 
12.haut de la page[ID=263597]Optical Remote Sensing of the Environment
07 Jui 2010 → 10 Jui 2010; Tucson, États-Unis

Résumé: This would be a first in a series of meetings focusing on specific topics in optical remote sensing of the environment. The first would address the coastal ocean and watersheds, with sessions emphasizing the inter-disciplinary nature of the topic. Sessions will cover the state of the art in instruments and methods for exploiting data from imaging spectrometers (hyperspectral/multi-spectral) and LIDAR. Sessions on specific topics such as bathymetry, coastal mapping, biophysical/geophysical retrieval (land and water), and atmospheric correction to name a few will be presented

Contact: Khara Minter; Mél.: kminte@osa.org
Sujets apparentés: Optique et lasers; Physique de l'environnement
 
13.haut de la page[ID=263574]Applied Industrial Optics: Spectroscopy, Imaging & Metrology
07 Jui 2010 → 10 Jui 2010; Tucson, États-Unis

Résumé: The proposed meeting will focus on advances in applied industrial optics. There will be three proposed topics: 1) Industrial Spectroscopy, 2)Industrial Imaging, and 3)Optical Metrology in Industry. Each topic will focus on applied technology that is currently utilized to enhance production, quality, and/or safety in an industrial setting. In addition, an attempt will be made to highlight current trends in applied optics that may have far reaching industrial implications. The meeting will draw from multiple industries to include: food & beverage, pharmaceutical, oil & gas, pulp & paper, chemical, biological, and defense. In addition, it is anticipated that the meeting attendance will be multidisciplinary

Page web: kminte@osa.org
Contact: Khara Minter
Sujets apparentés: Optique et lasers
 
14.haut de la page[ID=289176] 4th Japan - US Nondestructive Testing Symposium
07 Jui 2010 → 11 Jui 2010; Maui, HI, États-Unis
Sujets: Aging Infrastructure NDE Advancements towards Technology Transfer Future Direction & Possibilities in NDE Probability of Detection with NDE Materials Characterization Synergies within NDE Prognostic Tools for NDE NDE Developments for Transportation Systems NDE Modeling and Signal Processing Automated NDE Performance Based NDT Certification Criteria Measurement Analysis Non-Linear Ultrasonic Safety and Reliability
Page web: http://www.asnt.org/events/conferences/jsndi/jsndi.htm
Contact: The American Society for Nondestructive Testing Abstract Submission - Conference Dept., PO Box 28518, Columbus, OH 43228-0518, US
Sujets apparentés: Energie nucléaire et déchets radioactifs; Ingénierie
 
15.haut de la page[ID=323389]ISSSR — 2010 Intl Symposium on Spectral Sensing Research
21 Jui 2010 → 24 Jui 2010; Springfield, Missouri, États-Unis
Contact: Mél.: jim.jensen@us.army.mil
 
16.haut de la page[ID=267922]SPIE Astronomical Telescopes and Instrumentation
27 Jui 2010 → 02 Jul 2010; San Diego, Californie, États-Unis
Page web: http://spie.org/x1375.xml
Sujets apparentés: Opto-électronique et technique d'affichage; Astronomie, astrophysique et cosmologie
 
17.haut de la page[ID=279864]Gordon Research Conference — Signaling By Adhesion Receptors
11 Jul 2010 → 16 Jul 2010; Colby College, Waterville, ME, États-Unis
Page web: http://www.grc.org/meetings.aspx?year=2010
 
18.haut de la page[ID=304936]Annual Meeting of the Microbeam Analysis Society (MAS)and the Microscopy Society of America (MSA)
01 Aou 2010 → 05 Aou 2010; Portland, Oreg., États-Unis
Contact: N. Guy 11260 Roger Bacon Drive, Suite 500 Reston Va. U.S.A. 20190; Tél.: (+1-703-964-1240 ext14); Mél.: nicoleguy@conferencemanagers.com
Sujets apparentés: Microscopie
 
19.haut de la page[ID=311087]NIWeek 2010
03 Aou 2010 → 05 Aou 2010; Austin, TX, États-Unis

Résumé: NIWeek 2010, the 16th annual customer and technology conference, opens August 3 at the Austin Convention Center in Austin, Texas, for three days of interactive technical sessions, targeted summits, hands-on workshops, and exhibitions on the latest developments for design, control, automation, manufacturing, and test.

Page web: http://www.ni.com/niweek/
Contact: National Instruments Corporation, 11500 N Mopac Expwy., Austin, TX 78759-3504 US ; Tél.: ((800) 531-5066)
 

États-Unis: liste de tous les évènements/conférences.

dernière mise à jour: 27 Février 2010