Konferenzservice Mandl

Zusammenfassung: Photonics West includes the entire spectrum of light-driven technologies and attracts researchers and product developers from around the world. Four renowned symposia, 3,000 R&D presentations, and two robust exhibitions connect the brightest minds with leaders in science and technology. + BIOS 2009; + LASE 2009; + MOEMS-MEMS 2009; + OPTO 2009; + Register for the opportunity to: + Collaborate with colleagues across diverse fields and disciplines; + Add value to your own research efforts; + Get up to date on the latest developments in your field

Zusammenfassung: Share your research and development activities with colleagues, sponsors, customers, technologists, engineers, scientists, and clients in the growing industry of Micro- and Nanofabrication of MEMS and MOEMS.

Zusammenfassung: OPTO 2009 addresses the latest developments and advances in a broad range of optoelectronic technologies and their integration for a variety of applications. OPTO 2009 includes a new application program on Optical Communication: Systems and Sub-systems.

Zusammenfassung: Advances in solid-state lasers, parametric devices and nonlinear frequency conversion provide powerful tools for an increasingly broad range of applications including spectroscopy, metrology, remote sensing, communications, material processing, astronomy, medicine, biology and entertainment. Now in its 24th year, the Advanced Solid-State Photonics Topical Meeting remains the world's premier forum for discussing new developments in laser and nonlinear optical materials and devices. The upcoming meeting in Denver, Colorado will provide a spectacular setting for learning about these advances. Take this opportunity to be part of the year's most significant meeting on advanced solid-state laser sources. Plan to attend Advanced Solid-State Photonics 2009!

Zusammenfassung: Strategies in Light, The Leading Event for the Global LED Industry

Zusammenfassung: SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography. Present your work: Many of the enabling technologies that ultimately drive R&D in the field of semiconductor microlithography derive from the research presented at the SPIE Advanced Lithography. Don't miss the opportunity to present your important research on topics such as EUV, smart metrology, resist materials, processing technology, and design to colleagues and industry leaders. Collaborate with your colleagues: Bringing important research to market, now more so than ever, depends on the collaborative effort of colleagues in different locations, often working in different disciplines. SPIE Advanced Lithography draws over 4,000 of the most talented researchers and managers working in the lithography industry. Join your colleagues and work together to bring your research forward. Keep abreast of Technology Changes through Courses + Training: Begin planning to extend your education at SPIE Advanced Lithography. Leading experts in the field will keep you and your team current on our fast-changing technologies.

Zusammenfassung: This 3-day short course provides a detailed introduction to the use of LightTools for engineers and scientists who wish to model and analyze the interaction of light with opto-mechanical systems. It will assume some familiarity with optical concepts and terminology. You will learn to use all of the major features of the LightTools Core and Illumination modules through lectures, demonstrations, and the solution of exercises in hands-on computer workshop sessions.

Zusammenfassung: This 2-day course provides a practical overview of the LightTools Optimzation Module, COM Macro Programming, and Photorealistic Rendering capabilities. The course includes lectures, demonstrations, and hands-on computer workshop sessions.

Zusammenfassung: Participate in the meeting where you'll connect with researchers from universities, military, funding agencies, and industry on these topics: Smart Structures and Vehicles; + Actuators and Damping; + Biomimetics and Robotic Systems + Multifunctional Materials; + Embedded and Self Diagnosis Sensors; + Modeling and Control; + Sensor Networks; + Real-Time NDE; + Structural Health Monitoring. No other meeting brings all these technologies together in one place.

Zusammenfassung: The combined OFC/NFOEC audience spans the entire industry, from scientists and engineers to manufacturers and service providers. These two outstanding conferences provides attendees and exhibiting companies with the industry's most comprehensive view of optical technology—the latest research breakthroughs and innovations, plus the full spectrum of commercial products and services available.

Zusammenfassung: This course covers the basics on modeling, analyzing, optimizing, and tolerancing optical systems using CODE V, including hands-on workshops. It assumes familiarity with optical concepts and terminology.

Zusammenfassung: This short course will give current users of CODE V an opportunity to learn about and practice using a number of advanced topics and specialized techniques. You will learn how to solve current problems more effectively and also discover new applications for CODE V in your work.

Zusammenfassung: SPIE Optifab is the international event showcasing optical manufacturing technology. With over 1,700 attendees and 175 exhibitors, SPIE Optifab is the event to connect and learn. Present your research, take a course, research new products - attend SPIE Optifab 2009.

Zusammenfassung: OPTOmism: Photonics for the Green Revolution Conference & Exhibition

Zusammenfassung: The SID International Symposium, Seminar and Exhibition, now in its 47th year, is the premier international gathering of scientists, engineers, manufacturers and users in the electronic-display industry. With more than 550 booths and 7,600 attendees, SID is the leading North American show for the electronic-display industry.

Zusammenfassung: CLEO has evolved into a dynamic six-day event that has successfully bridged the science and applications sides of the optics and photonics industry. CLEO offers high-quality programming; the latest in the lasers, electro-optics and photonics industry; the CLEO Exhibit, which has over 350 participating companies; and a new location in Baltimore, Maryland. CLEO and PhAST 2008 is the must attend event of the year.

Zusammenfassung: The conference and exhibition where optical engineering meets emerging technologies of nanotechnology and science, photonic devices and solar energy and their applications.Hear the latest research from four international symposia:

• Optical Engineering + Applications
• Nanoscience + Engineering
• Photonic Devices + Applications
• Solar Energy + Applications

Zusammenfassung: The world's largest technical event that covers optical design, systems, and engineering plus applications for remote sensing, astronomy, space, and more.

Made up of 51 technical conferences with over 2100 technical papers, related courses, special events, networking opportunities, and a large instrument exhibit, the Optical Engineering + Applications event offers you the opportunity to learn about the latest developments in optical technologies that play key roles in advancing current and future real-world applications of light-based technologies.

In a world where interdisciplinary collaboration is the rule rather than the exception, the scope of the Optical Engineering + Applications technical program gives you opportunities to collaborate across disciplines that no other event can. Don't miss the Symposium-wide and Optical Engineering + Applications Plenary Events.

Zusammenfassung: The SPIE Photonic Devices + Applications conference covering the technology and application of organic and photonic materials and devices.The interdisciplinary Photonic Devices + Applications event features over 400 papers, related courses, special events, and exhibiting companies covering the enabling technologies and cutting-edge applications for organic and photonic materials, OLEDs and other imaging devices, detectors, and applications.In a world where interdisciplinary collaboration is the rule rather than the exception, the scope of the Photonic Devices + Applications technical program gives you opportunities to collaborate across disciplines that no other event can. Don't miss the Symposium-wide and Photonic Devices + Applications Plenary Events.

Zusammenfassung: The 2008 International Conference on Optical MEMS & Nanophotonics will bring together the latest technical advancement in the fields of optical micro-electro-mechanical systems and integrated micro-optics. The conference will also include the growing fields of nanophotonic devices and integrated systems. Integration and miniaturization of photonic and optical MEMS components and systems towards micro- and nano-scale for various applications will be the main theme of the conference.

Zusammenfassung: The IEEE International Conference on Group IV Photonics 2009 (GFP 2009) will be the 6th in a series which began in Hong Kong in 2004, followed by the editions in Antwerp (2005), Ottawa (2006) and Tokyo (2007). GFP 2008 will be held in Sorrento (Italy), and Back in the US for 2009 in San Francisco, California. It represents a major international forum to present and discuss recent research results on the development of Si-based photonic materials and devices for the electronics.

Zusammenfassung: The COSI topical meeting should be attended by all interested in the fundamental physics, numerical methods and physical hardware that advance the fields of imaging and sensing. This has applications in medical, defense, homeland security, inspection, testing, etc.

Zusammenfassung: FiO 2009 - the 93rd OSA Annual Meeting - and LS XXV unite the OSA and American Physical Society (APS) communities for five days of quality, cutting-edge presentations, fascinating invited speakers and a variety of special events. The FiO 2009 conference will also offer a number of Short Courses designed to increase participants knowledge of a specific subject while offering the experience of insightful teachers. An exhibit floor featuring leading optics companies will further enhance the meeting.

Zusammenfassung: The International Congress on Applications of Lasers & Electro-Optics has a long history as the conference where researchers and end-users meet to review the state-of-the-art in laser materials processing and predict where the future will lead. From its inception, ICALEO has been devoted to the field of laser materials processing and is viewed as the premier source of technical information in the field. Each year ICALEO features areas of topical interest. This year featured sessions include laser applications in the automotive, aerospace, electronics, bio-medical, and microfabrication fields.

Zusammenfassung: Your participation puts your research in front of the largest assembly of experts in the world. Present your work to your colleagues and get robust feedback on your research direction. Take advantage of this valuable opportunity.

Zusammenfassung: The combined OFC/NFOEC audience spans the entire industry, from scientists and engineers to manufacturers and service providers. These two outstanding conferences provides attendees and exhibiting companies with the industry's most comprehensive view of optical technology—the latest research breakthroughs and innovations, plus the full spectrum of commercial products and services available.

Zusammenfassung: FiO 2010 - the 94rd OSA Annual Meeting - and LS XXV unite the OSA and American Physical Society (APS) communities for five days of quality, cutting-edge presentations, fascinating invited speakers and a variety of special events. The FiO 2010 conference will also offer a number of Short Courses designed to increase participants knowledge of a specific subject while offering the experience of insightful teachers. An exhibit floor featuring leading optics companies will further enhance the meeting.

Zusammenfassung: FiO 2011 - the 95rd OSA Annual Meeting - and LS XXV unite the OSA and American Physical Society (APS) communities for five days of quality, cutting-edge presentations, fascinating invited speakers and a variety of special events. The FiO 2011 conference will also offer a number of Short Courses designed to increase participants knowledge of a specific subject while offering the experience of insightful teachers. An exhibit floor featuring leading optics companies will further enhance the meeting.

Zusammenfassung: FiO 2012 - the 96rd OSA Annual Meeting - and LS XXV unite the OSA and American Physical Society (APS) communities for five days of quality, cutting-edge presentations, fascinating invited speakers and a variety of special events. The FiO 2012 conference will also offer a number of Short Courses designed to increase participants knowledge of a specific subject while offering the experience of insightful teachers. An exhibit floor featuring leading optics companies will further enhance the meeting.