Konferenzservice Mandl

Zusammenfassung: SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography. Present your work: Many of the enabling technologies that ultimately drive R&D in the field of semiconductor microlithography derive from the research presented at the SPIE Advanced Lithography. Don't miss the opportunity to present your important research on topics such as EUV, smart metrology, resist materials, processing technology, and design to colleagues and industry leaders. Collaborate with your colleagues: Bringing important research to market, now more so than ever, depends on the collaborative effort of colleagues in different locations, often working in different disciplines. SPIE Advanced Lithography draws over 4,000 of the most talented researchers and managers working in the lithography industry. Join your colleagues and work together to bring your research forward. Keep abreast of Technology Changes through Courses + Training: Begin planning to extend your education at SPIE Advanced Lithography. Leading experts in the field will keep you and your team current on our fast-changing technologies.

Zusammenfassung: The seventh Annual IEEE Workshop on Microelectronics and Electron Devices will provide a forum for reviewing and discussing all aspects of microelectronics including processing, electrical characterization, design and new device technologies. This symposium will consist of both invited and contributed talks and papers as well as a poster session. Faculty, students, and researchers in industry are encouraged to contribute presentations on either completed research or work-in-progress.

Zusammenfassung: The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and technology and its application to micro and nanofabrication techniques. The conference brings together engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends.

Zusammenfassung: The eleventh annual IITC is sponsored by the IEEE Electron Devices Society as a premier conference for interconnect technology. The IITC provides a forum for professionals and researchers in semiconductor processing, advanced materials, equipment development, and interconnect systems to present and discuss exciting new science and technology.

Zusammenfassung: This meeting will focus on bringing together experts from across the energy value chain, with a focus on key issues, barriers, and opportunities for accelerating the impact of optics and photonics on energy-related technologies.

Zusammenfassung: SEMICON West is the flagship annual event for the global microelectronics industries, featuring manufacturing products and technologies for semiconductors, photovoltaics, MEMS, solid state lighting, flexible electronics, and related technologies.

Zusammenfassung: The IEEE International Conference on Group IV Photonics 2009 (GFP 2009) will be the 6th in a series which began in Hong Kong in 2004, followed by the editions in Antwerp (2005), Ottawa (2006) and Tokyo (2007). GFP 2008 will be held in Sorrento (Italy), and Back in the US for 2009 in San Francisco, California. It represents a major international forum to present and discuss recent research results on the development of Si-based photonic materials and devices for the electronics.