Conference Service Mandl

abstract: The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to engage with the most up-to-date research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.

abstract: AHPSL 2008 is a key event for the high-power semiconductor community to network with industry leaders, learn about the latest technologies and strategies and apply market data and case studies for established and emerging application areas to their own companies.

abstract: The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to engage with the most up-to-date research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.

abstract: SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography. Present your work: Many of the enabling technologies that ultimately drive R&D in the field of semiconductor microlithography derive from the research presented at the SPIE Advanced Lithography. Don't miss the opportunity to present your important research on topics such as EUV, smart metrology, resist materials, processing technology, and design to colleagues and industry leaders. Collaborate with your colleagues: Bringing important research to market, now more so than ever, depends on the collaborative effort of colleagues in different locations, often working in different disciplines. SPIE Advanced Lithography draws over 4,000 of the most talented researchers and managers working in the lithography industry. Join your colleagues and work together to bring your research forward. Keep abreast of Technology Changes through Courses + Training: Begin planning to extend your education at SPIE Advanced Lithography. Leading experts in the field will keep you and your team current on our fast-changing technologies.